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4-Acetoxystyrene

By Hubei Jiayun Chemical Technology Co.,Ltd

4-Acetoxystyrene

03/17/2013 4-Acetoxystyrene
4-Acetoxystyrene monomer is mainly used in the synthesis of polyhydroxystyrene. Polyhydroxystyrene is the main component fo photoresist which currently is the main body of the 248nm photoresist resin. 248nm photoresist is mainly used in the field of microelectronic chips and liquid crystal displays,with the wavelength of 248nmKrf laser for processing medium,widely used in the large-scale industrialization lithography production.
Through continuous research and innovation,our company develop a set of industrial production process of the products nd produce qualified industrial samples.It will be a positive role in promoting the 248nm photoresist localization.
Molecular Formula: C10H10O2
Molecular Weight:162.19
Appearance:colorless transparent liquid,no floating debris
Melting Point:7-8(lit.)
Boiling point:260(lit.)
Density:1.06 g/ml at 25(lit.)
Flash Point: 190 °F

About This Author

Hubei Jiayun Chemical Technology Co.,Ltd

Hubei Jiayun Chemical Technology Co.,Ltd

Hubei Jiayun Chemical Technology Co.,Ltd is located in Liukou Industrial Park ,Xiantao city,Hubei provice which is only 500 meters from the Han (Wuhan) YI ( Yichang) expressway in the centre China. The traffic is very convenient. The company covers land area of 20000 square meters.There are three mo…

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